The D.T.S. company produces special sputtering targets and special powder for sintering technology.

Sputtering targets for the thin film deposition of thermoelectric materials are manufactured by melting-metallurgy.

Grinding and sieving techniques allow the powder production in the wished grain size fraction for sintering technologies or flash evaporation.

The favoured material typ are alloys of Bismuttellurid (Bi₂Te₃).

Standard sizes are:

• diameter of targets:  90 mm
• grain size fractions: between 20 and 1000 µm.